PHOTOELECTROCHEMICAL STUDY OF OXIDE LAYERS ON TIN IN 1N KOH

被引：35

作者：

BURLEIGH, TD ^{[1
]}

GERISCHER, H ^{[1
]}

机构：

[1] MAX PLANCK GESELL,FRITZ HABER INST,FARADAYWEG 4-6,D-1000 BERLIN 33,FED REP GER

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 12期

关键词：

Chemical Reactions--Photochemical Reactions - Electrochemistry - Films--Metallic - Metals and Alloys--Corrosion Resisting - Tin Compounds--Thin Films;

D O I：

10.1149/1.2095466

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Tin metal is studied using photoelectrochemistry in 1N KOH solution. In the passive region, there are two distinct oxy-hydroxide films on the surface which are stable over different potential ranges. The first oxy-hydroxide film exists at low positive potentials, can easily be reduced, and is transformed by intense illumination into the more stable oxide. The second oxy-hydroxide film exists at higher positive potentials and is stable under illumination.

引用

页码：2938 / 2942

页数：5

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