EXPANSION OF LASER-PLASMA IN OXYGEN AT LASER DEPOSITION OF HTSC FILMS - THEORETICAL-MODEL

被引：47

作者：

PREDTECHENSKY, MR

MAYOROV, AP

机构：

[1] Institute of Thermophysics

来源：

APPLIED SUPERCONDUCTIVITY | 1993年 / 1卷 / 10-12期

关键词：

D O I：

10.1016/0964-1807(93)90349-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The theoretical model describing the expansion of laser plasma in the background gas for laser deposition of HTSC films has been developed. The expressions connecting laser pulse energy, background gas pressure, radiation spot radius, mass of evaporated matter of target and the maximal dimension of the evaporated matter expansion (R) have been obtained. Temperature and density of expanding LP and energy of atoms near substrate surface have been estimated. Problems of optimization of the laser deposition are discussed on the basis of the presented results.

引用

页码：2011 / 2017

页数：7

共 7 条

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[2]

SIGG RK, 1990, NARAYAN J PHYS REV B, V41, P8843

[3]

TCHERNY GG, 1957, DOKL AKAD NAUK, V112, P213

[4]

VARLAMOV YD, 1988, PISMA ZH TEKH FIZ+, V14, P2068