THE CALCULATION AND USE OF CHEMICAL VAPOR-DEPOSITION PHASE-DIAGRAMS WITH APPLICATIONS TO THE TI-B-CL-H SYSTEM BETWEEN 1200 AND 800-K

被引：16

作者：

RANDICH, E

GERLACH, TM

机构：

来源：

THIN SOLID FILMS | 1981年 / 75卷 / 03期

关键词：

D O I：

10.1016/0040-6090(81)90406-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：271 / 291

页数：21

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