FORBIDDEN REFLECTIONS SI (200) AND (600) IN CBED AND THEIR COMPUTER-SIMULATION

被引:7
作者
ZHOU, F
MOLLENSTEDT, G
机构
[1] Institute of Applied Physics, University of Tübingen, Tübingen
关键词
D O I
10.1016/0304-3991(92)90215-6
中图分类号
TH742 [显微镜];
学科分类号
摘要
The forbidden reflections Si (200) and (600) are observed with high intensity with a [001]-oriented Si perfect crystal along the (400) Kikuchi line in convergent beam electron diffraction (CBED) patterns with 100-600 keV high-energy electrons. A condition for the occurrence of such forbidden reflections is found. The incident angle of electrons satisfies the Bragg conditions for the forbidden reflection and for at least one high-order reflection simultaneously. Two-dimensional computer simulations based on the many-beam Bloch wave method show very good agreement with the experimental results. It is concluded that the forbidden reflections are caused by dynamic scattering effects rather than by a defect structure of the specimen and surface scattering effects. Associated Bloch waves psi(200) and psi(600) are confirmed to be excited.
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页码:359 / 366
页数:8
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