EFFECTS OF IMPLANTATION IN RUTILE WITH METALLIC-IONS

被引：9

作者：

GUERMAZI, M

THEVENARD, P

DUPIN, JP

DUPUY, CHS

机构：

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1980年 / 49卷 / 1-3期

关键词：

D O I：

10.1080/00337578008243068

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：61 / 64

页数：4

共 11 条

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[3] EVIDENCE OF CHEMICAL EFFECTS DUE TO IMPLANTATION OF 28 MEV DEUTERONS IN RUTILE [J].

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DUPUY, CHS .

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[4] ROLE OF RECOIL IMPLANTATION IN ALTERING STOICHIOMETRY OF A BOMBARDED SOLID [J].

KELLY, R ;

SANDERS, JB .

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[5]

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[6] INCREASE IN ELECTRICAL CONDUCTIVITY OF MOO3 AND V2O5 FOLLOWING ION-BOMBARDMENT - STUDIES ON BOMBARDMENT-ENHANCED CONDUCTIVITY .1. [J].

NAGUIB, HM ;

KELLY, R .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1972, 33 (09) :1751-+

[7] CHEMICAL IMPLANTATION OF 10-KEV H+ AND D+ IN RUTILE [J].

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VARMA, R .

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[8]

THEVENARD P, 1976, C METALLURGIE INSTN

[9]

THEVENARD P, 1974, THESIS LYON

[10]

THEVENARD P, 1976, J PHYS, V37, P526

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