PRECISION MANUFACTURE AND REGISTRATION OF MASKS FOR VACUUM EVAPORATION

被引：5

作者：

HILL, AE

RIGBY, PA

机构：

来源：

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1969年 / 2卷 / 12期

关键词：

D O I：

10.1088/0022-3735/2/12/318

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An apparatus is described which enables a set of six masks to be repeatedly registered with a substrate in a high-vacuum environment with an accuracy to ±1 μm. Details are given of the mask manufacture, which involves preferential etching techniques to produce high definition patterns. An analysis is made of the registration errors to be expected.

引用

页码：1084 / &