CHARACTERIZATION OF HYDROGENATED AMORPHOUS-SILICON - SOME BEHAVIORS OF HYDROGEN AND IMPURITIES STUDIED BY FILM CHARACTERIZATION TECHNIQUES

被引：5

作者：

IMURA, T

KUBOTA, K

USHITA, K

HIRAKI, A

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷

关键词：

D O I：

10.7567/JJAPS.19S2.99

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：99 / 103

页数：5

共 9 条

[1]

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