DEVELOPMENT OF RF SPUTTERED CHROMIUM-OXIDE COATING FOR WEAR APPLICATION

被引:26
作者
BHUSHAN, B
机构
[1] Advanced Technology Department, Mechanical Technology Incorporated, Latham, NY 12110
基金
美国国家航空航天局;
关键词
D O I
10.1016/0040-6090(79)90515-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The radio frequency sputtering technique was used to deposit a hard refractory, chromium oxide coating on an Inconel X-750 foil 0.1 mm thick. Optimized sputtering parameters for a smooth and adherent coating were found to be as follows: target-to-substrate spacing, 41.3 mm; argon pressure, 5-10 mTorr; total power to the sputtering module, 400 W (voltage at the target, 1600 V); and a water-cooled substrate. The coating on the annealed foil was more adherent than that on the heat-treated foil. Substrate biasing during the sputter deposition of Cr2O3 adversely affected adherence by removing naturally occurring interfacial oxide layers. The deposited coatings were amorphous and oxygen deficient. Since amorphous materials are extremely hard, the structure was considered to be desirable. © 1979.
引用
收藏
页码:231 / 241
页数:11
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