CORRELATIONS BETWEEN ACTIVE SPECIES DENSITY AND IRON NITRIDE LAYER GROWTH IN AR-N2-H2 MICROWAVE POSTDISCHARGES

被引：32

作者：

MALVOS, H ^{[1
]}

MICHEL, H ^{[1
]}

RICARD, A ^{[1
]}

机构：

[1] UNIV PARIS 11,CNRS,LPGP,F-91405 ORSAY,FRANCE

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1994年 / 27卷 / 06期

关键词：

D O I：

10.1088/0022-3727/27/6/034

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Correlations are demonstrated between the production of N, H and NH active species in an Ar-N2-H-2 microwave flowing post-discharge and the thickness of epsilon and gamma' layers on a pure iron substrate. The Fe2-3N, epsilon-layer thickness increases with N atom density when oxide layers are simultaneously removed by H atoms. A maximum has been found in the post-discharge reactivity when the H-2/N2 density ratio is in the 10(-3)-10(-2) range.

引用

页码：1328 / 1332

页数：5

共 8 条

[1]

BARAVIAN G, 1993, ISPC 11, V4, P1511

[2] SPECTROSCOPY OF FLOWING DISCHARGES AND POSTDISCHARGES IN REACTIVE GASES [J].