THE EFFECT OF SPUTTER DEPOSITION CONDITIONS ON GROWTH-MECHANISM AND MICROSTRUCTURE OF YBA2CU3O7-X THIN-FILMS ON NDGAO3 SUBSTRATES STUDIED BY SCANNING TUNNELING MICROSCOPY

被引：13

作者：

HAWLEY, ME

RAISTRICK, ID

HOULTON, RJ

GARZON, FH

PIZA, M

机构：

[1] Los Alamos National Laboratory, Los Alamos

来源：

ULTRAMICROSCOPY | 1992年 / 42卷

关键词：

D O I：

10.1016/0304-3991(92)90346-L

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Thin films of YBa2CU3O7-x were deposited on a perovskite substrate, NdGaO3, by off-axis RF magnetron sputtering at it variety of different temperature, total pressure and oxygen partial pressure (pO2) growth conditions in order to study their effect on microstructure. The resulting c-axis and combined c/a-axis-normal films were characterized by scanning tunneling and atomic force microscopies, X-ray diffraction, and eddy-current measurements. Initial stages of deposition proceeded by c-axis-oriented growth on all films. At low pO2, a transition to a-axis perpendicular growth was observed. beyond a critical thickness, while at high pO2, exclusively c-axis perpendicular material was found. A transition from a spiral growth mechanism to a nucleation-dominated growth regime is discussed.

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页码：705 / 714

页数：10

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