DC SPUTTER DEPOSITION OF YBA2CU3O7 THIN-FILMS FOR 2 SIDED COATING

A simple vacuum system for the deposition of YBa2Cu3O7 (YBCO) thin films by DC sputtering is described. This system enables one to perform YBCO film deposition on both sides of any appropriate wafer such as MgO for applications in passive microwave devices. The films are characterized by measurements of their X-ray diffraction, thickness uniformity and transport properties. These measurements indicate that (1) the films are perfectly c-axis oriented normal to the wafer, (2) thickness uniformity of 10% over an area of 10 mm diameter is obtained in the center of the film (from a 24 mm diameter target), (3) the critical temperature is T(c)(R = 0) = 90 K and (4) the critical current density at liquid nitrogen temperature J(c)(77 K) is over 2 x 10(6) A/cm2.