EFFECT OF LOAD ON THE HARDNESS OF HOT ISOSTATICALLY PRESSED SILICON-NITRIDE

被引:19
作者
BERRICHE, R
HOLT, RT
机构
[1] Institute for Aerospace Research, National Research Council, Ottawa, Ontario
关键词
D O I
10.1111/j.1151-2916.1993.tb03946.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The hardness values of five hot isostatic pressed silicon nitride materials, with varying densities, were measured at loads between 1 and 200 N. For the fully dense materials, the calculated hardness decreased from about 30 to 15 GPa as the load increased to about 10 N, and the hardness remained constant at higher loads. For the samples that showed indentation size effect (ISE), cracks formed at the corners of the indentation, starting at the lowest load of 1 N. Materials with lower densities had lower hardness values, displayed a very small or no ISE, and formed corner cracks only at high loads. For the samples that displayed an ISE at low loads, the formation of cracks was analyzed using the Niihara et al. criterion for Palmqvist cracks.
引用
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页码:1602 / 1604
页数:3
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