UV WRITTEN REFLECTION GRATING STRUCTURES IN PHOTOSENSITIVE OPTICAL FIBERS USING PHASE-SHIFTED PHASE MASKS

被引：105

作者：

KASHYAP, R

MCKEE, PF

ARMES, D

机构：

[1] BT Laboratories, Martksham Heath, Ipswich

来源：

ELECTRONICS LETTERS | 1994年 / 30卷 / 23期

关键词：

GRATINGS IN FIBERS; OPTICAL FIBERS;

D O I：

10.1049/el:19941357

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Reflection grating structures have been replicated in photosensitive optical fibres using phase shifted phase masks for the first time. The sensitivity of the narrow bandpass peak to alignment and position of the phase shift are reported.

引用

页码：1977 / 1978

页数：2

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[6] 30PS CHROMATIC DISPERSION COMPENSATION OF 400FS PULSES AT 100 GBITS/S IN OPTICAL FIBERS USING AN ALL-FIBER PHOTOINDUCED CHIRPED REFLECTION GRATING
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[7] KASHYAP R, 1993, BT TECHNOL J, V11
[8] KASHYAP R, 1994, ELECTRON LETT, V30
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[10] FUSED-SILICA MASKS FOR PRINTING UNIFORM AND PHASE ADJUSTED GRATINGS FOR DISTRIBUTED FEEDBACK LASERS
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[J]. APPLIED PHYSICS LETTERS, 1993, 62 (03) : 222 - 224

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