LOW-TEMPERATURE OXIDATION OF NONSTOICHIOMETRIC SPUTTER DEPOSITED VANADIUM PENTOXIDE

被引：18

作者：

AITA, CR ^{[1
]}

KAO, ML ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574726

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2714 / 2717

页数：4

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