SCALING BEHAVIOR OF DEPOSITION MODELS WITH LIMITED DOWNWARD MOBILITY

被引:8
作者
KANG, HC
EVANS, JW
机构
[1] IOWA STATE UNIV SCI & TECHNOL, DEPT MATH, AMES, IA 50011 USA
[2] IOWA STATE UNIV SCI & TECHNOL, AMES LAB, AMES, IA 50011 USA
来源
PHYSICAL REVIEW A | 1991年 / 44卷 / 04期
关键词
D O I
10.1103/PhysRevA.44.2335
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have studied the interface-width scaling behavior of deposition models in which limited downward mobility is introduced. In all the models studied here, there is a maximum allowed slope for the interface at which the growth velocity is zero. The Kardar-Parisi-Zhang equation is resummed in order to show explicitly this slope constraint, but still incorporates parameters lambda-measuring the slope dependence of the growth velocity, nu measuring the surface tension, and D measuring the noise amplitude. Increasing mobility naturally smooths the interface, and is associated with a decrease in the magnitude of lambda-eff = lambda-D1/2/nu-3/2. A detailed study of a bridge-site deposition model, with one hop of probability p, shows that \lambda\ increases with p. From an independent assessment of noise-amplitude behavior, we can conclude that nu must also increase with p to ensure the required lambda-eff behavior. Direct determination of nu via the Wolf-Tang procedure of imposing inhomogeneity on some length scale L supports this conclusion. (However nu depends on the inhomogeneity strength, which should be chosen small, and on L.) We comment on anticipated behavior of similar limited-mobility models in d greater-than-or-equal-to 2 dimensions, and compare with behavior of limited-mobility ballistic deposition and noise-reduced deposition models.
引用
收藏
页码:2335 / 2344
页数:10
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