GIANT MAGNETORESISTANCE IN CO/CU MULTILAYERS AFTER ANNEALING

被引：20

作者：

MCGUIRE, TR ^{[1
]}

HARPER, JM ^{[1
]}

CABRAL, C ^{[1
]}

PLASKETT, TS ^{[1
]}

机构：

[1] INST ENGN SISTEMAS & COMPUTADORES,P-1000 LISBON,PORTUGAL

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 76卷 / 10期

关键词：

D O I：

10.1063/1.358206

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Multilayer films of [Co 10 Å/Cu(t)]64 with copper thicknesses from t=10 to 29 Å annealed for 1 h at temperatures about 350°C showed a decrease in sample resistivity at 4.2 K. The giant magnetoresistance (GMR) maximums for as-deposited films at t=10 Å and t=23 Å shifted with annealing. The GMR decreased for t=10 Å and t=23 Å but increased for t=19 Å and t=29 Å indicating a complex behavior with annealing. Similarities with granular films are discussed.

引用

页码：6601 / 6603

页数：3

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