EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER

被引：267

作者：

KAWAMURA, Y

TOYODA, K

NAMBA, S

机构：

来源：

关键词：

D O I：

10.1063/1.93108

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：374 / 375

页数：2

共 6 条

[1] AOYAGI A, 1979, OPTICS COMMUN, V29, P253
[2] VACUUM ULTRAVIOLET HOLOGRAPHY
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YOUNG, JF
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[3] NEW HIGH-RESOLUTION CHARGE-TRANSFER X-RAY AND ELECTRON-BEAM NEGATIVE RESIST
HOFER, DC
KAUFMAN, FB
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AVIRAM, A
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[4] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320
[5] 100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM
TISONE, GC
HAYS, AK
HOFFMAN, JM
[J]. OPTICS COMMUNICATIONS, 1975, 15 (02) : 188 - 189
[6] TEMPORARY GRATINGS ON GERMANIUM
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SALIK, A
[J]. APPLIED PHYSICS LETTERS, 1974, 25 (08) : 438 - 440