FIELD-ION SOURCES USING EUTECTIC ALLOYS

被引：14

作者：

GAMO, K

UKEGAWA, T

NAMBA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期

关键词：

D O I：

10.1143/JJAP.19.L379

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L379 / L382

页数：4

共 10 条

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[4]

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[5]

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[6] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION [J].

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WARD, JW ;

WANG, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1610-1612

[7] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

APPLIED PHYSICS LETTERS, 1979, 34 (05) :310-312

[8] IMPROVED ELECTRON FILTER LENS [J].

SIMPSON, JA ;

MARTON, L .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1961, 32 (07) :802-&

[9] EMISSION CHARACTERISTICS OF GALLIUM AND BISMUTH LIQUID-METAL FIELD-ION SOURCES [J].

SWANSON, LW ;

SCHWIND, GA ;

BELL, AE ;

BRADY, JE .

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[10]

SWANSON LW, 1979, SCANNING ELECTRON MI, V1, P45

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