THE HALL RESISTIVITY OF SPUTTERED AMORPHOUS FE-B FILMS

被引:11
作者
FUKAMICHI, K [1 ]
GAMBINO, RJ [1 ]
MCGUIRE, TR [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.328877
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:2199 / 2201
页数:3
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