XENON ADSORPTION AS A TOOL FOR LOCAL SURFACE-STRUCTURE DETERMINATION AT IR(100) SURFACES

被引:34
作者
KUPPERS, J
MICHEL, H
NITSCHKE, F
WANDELT, K
ERTL, G
机构
[1] Institut für Physikalische Chemie, Universität München
关键词
D O I
10.1016/0039-6028(79)90622-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of Xe at reconstructed (5 × 1), unreconstructed (1 × 1) and partially reconstructed Ir(100) surfaces has been studied using UV photoemission. It is found that the Xe induced photoemission peaks, due to emission from Xe 5p 1 2 and 5p 3 2 orbitals, are displaced by 0.3 eV comparing spectra obtained at (1 × 1) and (5 × 1) Ir(100) surfaces at saturation Xe coverage. In addition, with both surface structures the Xe induced 5p photoemission features shift to higher binding energies with increasing coverage in accord with various other Xe/metal systems. Using the Xe 5p emission as a fingerprint of the surface structure, spectra obtained at partially reconstructed Ir(100) surfaces clearly are composed of weighted contributions from Xe adsorbed at (1 × 1) and (5 × 1) surfaces, respectively. From this it can be concluded that adsorbed Xe senses the local surface structure present in patches of (1 × 1) and (5 × 1) surface geometry. © 1979.
引用
收藏
页码:361 / 369
页数:9
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