PROGRESS IN OPTIMIZATION OF TRANSITION-METAL CATION CHROMATOGRAPHY AND ITS APPLICATION TO ANALYSIS OF SILICON-WAFER CONTAMINATION

被引：13

作者：

RUTH, KA

SHAW, RW

机构：

[1] MEMC Electronic Materials Co., St. Peters, MO 63376

来源：

JOURNAL OF CHROMATOGRAPHY | 1991年 / 546卷 / 1-2期

关键词：

D O I：

10.1016/S0021-9673(01)93022-5

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Methods are reported which yield sensitive semi-quantitative analysis of transition metal contaminants on silicon wafers. An effective extracting solution is proposed together with compatible concentrators and two eluent (column and post-column) chemistry combinations to measure ppt (10(12)) concentrations and surface densities extending into the 10(10) atoms per cm2 range. Possible applications include numerous steps in wafer and integrated circuit manufacture as well as other solid-surface analysis.

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页码：243 / 249

页数：7

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