X-RAY-FLUORESCENCE MEASUREMENTS OF X-RAY-ABSORPTION NEAR-EDGE STRUCTURE AT THE SI, P, AND S L-EDGES

被引:83
作者
KASRAI, M [1 ]
YIN, ZF [1 ]
BANCROFT, GM [1 ]
TAN, KH [1 ]
机构
[1] UNIV WISCONSIN, CANADIAN SYNCHROTRON RADIAT FACIL, STOUGHTON, WI 53589 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1993年 / 11卷 / 05期
关键词
D O I
10.1116/1.578628
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
High-resolution (less-than-or-equal-to 0.2 eV) x-ray absorption near edge structure (XANES) spectra have been recorded at the Si, P, and S 2p edges of several compounds using microchannel plates to detect the ultrasoft x-ray fluorescence after 2p excitation or ionization. The fluorescence yield (FY) XAN-ES of SiO2, Si, InP, FeS2, and Na2S2O3 are of at least as good quality as the XANES recorded using total electron yield (TEY), despite the extremely small fluorescence yield. The FY spectra obtained show two significant advantages over the TEY spectra. First, the FY XANES is much more bulk sensitive; and second the resolution of the FY spectra is usually considerably better.
引用
收藏
页码:2694 / 2699
页数:6
相关论文
共 30 条