COMPUTER MODEL OF SF6-H2 ELECTRICAL DISCHARGE CHEMICAL LASER

被引：25

作者：

LYMAN, JL ^{[1
]}

机构：

[1] UNIV CALIF, LOS ALAMOS SCI LAB, LOS ALAMOS, NM 87544 USA

来源：

APPLIED OPTICS | 1973年 / 12卷 / 11期

关键词：

D O I：

10.1364/AO.12.002736

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2736 / 2747

页数：12

共 58 条

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