COMBINED WAVELENGTH AND FREQUENCY-MODULATION SPECTROSCOPY - A NOVEL DIAGNOSTIC-TOOL FOR MATERIALS PROCESSING

被引：14

作者：

SUN, HC

WHITTAKER, EA

BAE, YW

NG, CK

PATEL, V

TAM, WH

MCGUIRE, S

SINGH, B

GALLOIS, B

机构：

[1] RES CTR, PRINCETON, NJ 08543 USA

[2] STEVENS INST TECHNOL, DEPT MAT SCI & ENGN, HOBOKEN, NJ 07030 USA

[3] NEW JERSEY INST TECHNOL, DEPT ELECT ENGN, NEWARK, NJ 07102 USA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 06期

关键词：

LASER ABSORPTION SPECTROSCOPY; TUNABLE DIODE LASER; PLASMA ETCHING; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION;

D O I：

10.1364/AO.32.000885

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

By applying both low-frequency wavelength modulation and high-frequency phase modulation to a laser diode, we develop a sensitive, high-bandwidth chemical diagnostic tool that is applicable to a variety of gas-phase processing environments. Specific chemical species are identified and monitored through their infrared absorption spectra, and the modulation methods allow for sensitive detection that is free of window and other reflection-driven interference fringes. Absorbance limits of 5.3 x 10(-8) and 1.9 x 10(-7) are obtained for an AlGaAs diode laser and a lead-salt diode laser, respectively. We discuss applications to plasma etching and chemical vapor deposition.

引用

页码：885 / 893

页数：9

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