AN INFRARED STUDY OF THE REACTION OF OCTADECYLTRICHLOROSILANE WITH SILICA

被引:292
作者
TRIPP, CP
HAIR, ML
机构
[1] Xerox Research Centre of Canada, Mississauga, Ontario L5K 2L1
关键词
D O I
10.1021/la00040a018
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The reaction of octadecyltrichlorosilane with a high surface area fumed silica was studied by infrared spectroscopy. We have found that the amount of water adsorbed on the surface was critical for adsorption to occur. We have shown that there is no direct reaction of octadecyltrichlorosilane (OTS) with the surface hydroxyl groups of adsorption with the first water layer bound to the surface of a fumed silica. Adsorption of the OTS does occur with the subsequent layers of water.
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页码:1120 / 1126
页数:7
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