THERMAL AND ACID-CATALYZED DEPROTECTION KINETICS IN CANDIDATE DEEP-ULTRAVIOLET RESIST MATERIALS

被引：85

作者：

WALLRAFF, G ^{[1
]}

HUTCHINSON, J ^{[1
]}

HINSBERG, W ^{[1
]}

HOULE, F ^{[1
]}

SEIDEL, P ^{[1
]}

JOHNSON, R ^{[1
]}

OLDHAM, W ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587454

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3857 / 3862

页数：6

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