LOW-ENERGY NEUTRAL ION BACKSCATTERING AT AS/SI(001)

被引：20

作者：

NIEHUS, H ^{[1
]}

MANN, K ^{[1
]}

ELDRIDGE, BN ^{[1
]}

YU, ML ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575180

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：625 / 629

页数：5

共 22 条

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[10]

NIEHUS H, 1986, SURF SCI, V166, pL107, DOI 10.1016/0039-6028(86)90518-2

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