HIGH MAGNIFICATION UNSTABLE RESONATOR EXCIMER LASER

被引：15

作者：

JAMES, D

MCKEE, TJ

SKRLAC, W

机构：

[1] Research Limited, Kanata (Ottawa), Ont.

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1979年 / 15卷 / 05期

关键词：

D O I：

10.1109/JQE.1979.1070014

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

High brightness performance has been achieved in a UV preionized transverse discharge KrF excimer laser by using a high magnification unstable resonator configuration. The properties of laser brightness as a function of resonator magnification are examined. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.

引用

页码：335 / 336

页数：2

共 5 条

[1] IMPROVED BEAM QUALITY IN DOUBLE DISCHARGE EXCIMER LASERS
BARKER, DL
LOREE, TR
[J]. APPLIED OPTICS, 1977, 16 (07): : 1792 - 1793
[2] Isaev A. A., 1977, Soviet Journal of Quantum Electronics, V7, P746, DOI 10.1070/QE1977v007n06ABEH012888
[3] DIFFRACTION-LIMITED KRF AND XEF LASERS WITH A NEGATIVE-BRANCH UNSTABLE RESONATOR
MCKEE, TJ
STOICHEFF, BP
WALLACE, SC
[J]. APPLIED PHYSICS LETTERS, 1977, 30 (06) : 278 - 280
[4] UNSTABLE OPTICAL RESONATORS
SIEGMAN, AE
[J]. APPLIED OPTICS, 1974, 13 (02) : 353 - 367
[5] YARIV A, 1971, INTRO OPTICAL ELECTR

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