ROLE OF HIGHER SILANES IN THE PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE

被引:15
作者
HEINTZE, M [1 ]
VEPREK, S [1 ]
机构
[1] UNIV ZURICH,INST INORGAN CHEM,CH-8057 ZURICH,SWITZERLAND
关键词
D O I
10.1063/1.100703
中图分类号
O59 [应用物理学];
学科分类号
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页码:1320 / 1322
页数:3
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