ADSORPTION-SITE-DEPENDENT X-RAY-ABSORPTION SPECTROSCOPY - CO/H,H2/NI(100)

被引：24

作者：

TILLBORG, H ^{[1
]}

NILSSON, A ^{[1
]}

MARTENSSON, N ^{[1
]}

ANDERSEN, JN ^{[1
]}

机构：

[1] UNIV LUND,DEPT SYNCHROTRON RADIAT RES,S-22363 LUND,SWEDEN

来源：

PHYSICAL REVIEW B | 1993年 / 47卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.47.1699

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Three high-symmetry adsorption sites of CO on Ni(100) have been studied by x-ray photoabsorption spectroscopy. The sites are known to be populated in the CO/H,H-2/Ni(100) system. The position and width of the CO 2pi* resonance is dependent on the adsorption site. The adsorption threshold shifts in accordance with the large shifts observed in x-my photoelectron spectroscopy. Information about the ground-state population of the 2pi*-derived CO orbitals is obtained from the resonance intensity, showing substantially larger population for CO adsorbed in the hollow sites.

引用

页码：1699 / 1702

页数：4

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