THERMOPHORETIC DEPOSITION OF SMALL PARTICLES IN THE MODIFIED CHEMICAL VAPOR-DEPOSITION (MCVD) PROCESS

被引：95

作者：

WALKER, KL

GEYLING, FT

NAGEL, SR

机构：

来源：

关键词：

D O I：

10.1111/j.1151-2916.1980.tb10763.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：552 / 558

页数：7

共 19 条

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