OBSERVATION OF THE RELAXATION PROCESSES THAT FOLLOW ATOM REMOVAL FROM THE AU(111) SURFACE WITH THE SCANNING TUNNELING MICROSCOPE

被引:10
作者
HASEGAWA, Y [1 ]
AVOURIS, P [1 ]
机构
[1] IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 03期
关键词
D O I
10.1116/1.587602
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The scanning tunneling microscope (STM) has been used to perturb distribution of surface stress, and to observe the resulting relaxation processes in a time-resolved manner. Using nanoscale manipulation with the STM, we generated a hole with a radius of about 10 angstrom on the 22 X square-root 3 reconstructed structure of Au(111) surface, and observed the rearrangement of the dislocation lines of the reconstructed surface as a result of the formation of the hole. The area in which the pattern of dislocation lines is affected extends to about 80 angstrom from the site of the hole. The large range of the perturbation is most likely due to the long-range substrate-mediated elastic interaction of the hole with domain boundaries of the reconstructed surface. We find that a structure involving a closed loop of dislocation lines is formed at the initial stage of the relaxation process.
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页码:1797 / 1800
页数:4
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