PHOTOSTRUCTURAL EFFECTS IN GLASSY AS2SE3 AND AS2S3

被引:51
作者
TREACY, DJ
STROM, U
KLEIN, PB
TAYLOR, PC
MARTIN, TP
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
[2] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
关键词
D O I
10.1016/0022-3093(80)90336-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1035 / 1039
页数:5
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