THEORY OF RADIATIVE RECOMBINATION BY DIFFUSION AND TUNNELING IN AMORPHOUS SI-H

被引：47

作者：

HONG, KM ^{[1
]}

NOOLANDI, J ^{[1
]}

STREET, RA ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

PHYSICAL REVIEW B | 1981年 / 23卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.23.2967

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2967 / 2976

页数：10

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