GAS-PHASE COMPOSITION IN THE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON DIOXIDE

被引：25

作者：

TOBIN, PJ

PRICE, JB

CAMPBELL, LM

机构：

来源：

关键词：

D O I：

10.1149/1.2129379

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2222 / 2227

页数：6

共 17 条

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Stewart, K .

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