DEPOSITION OF BI, SR, CA, AND CU OXIDE-FILMS BY RF GLOW-DISCHARGE GENERATED AT RELATIVELY HIGH-PRESSURE

被引:4
作者
HASHIMOTO, T
FUKUDA, K
KOGOMA, M
OKAZAKI, S
YOSHIMOTO, M
KOINUMA, H
机构
来源
MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 1990年 / 184卷
关键词
D O I
10.1080/00268949008031762
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:201 / 205
页数:5
相关论文
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