LOW PRESSURE SPUTTERING SYSTEM OF MAGNETRON TYPE

被引：41

作者：

WASA, K

HAYAKAWA, S

机构：

[1] Wireless Research Laboratory, Matsushita Electric Industrial Company, Limited, Kadoma, Osaka

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1969年 / 40卷 / 05期

关键词：

D O I：

10.1063/1.1684039

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A new design of a low pressure sputtering system of magnetron type is described. The optimum sputtering conditions are discussed in relation to the system. It is shown that this system is able to produce uniform thin films with good reproducibility, and especially to produce a metal oxide film by reactive sputtering. Some typical configurations are presented for use in the laboratory and on a production scale. © 1969 The American Institute of Physics.

引用

页码：693 / &