OPTO-GALVANIC SPECTROSCOPY IN A URANIUM HOLLOW-CATHODE DISCHARGE

被引：82

作者：

KELLER, RA

ENGLEMAN, R

ZALEWSKI, EF

机构：

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1979年 / 69卷 / 05期

关键词：

D O I：

10.1364/JOSA.69.000738

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Laser induced impedance changes in a hollow cathode discharge containing sputtered uranium atoms have been used for standard spectroscopic measurements, the determination of oscillator strengths, the measurement of the electron temperature of the discharge, isotope ratio analysis, and obtaining information about the sputtering process. It was found that concentrations of uranium atoms as small as 10**8/cc could be detected.

引用

页码：738 / 742

页数：5

共 14 条

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