ORIENTATIONAL DEPENDENCE OF THE EXCHANGE BIASING IN MOLECULAR-BEAM-EPITAXY-GROWN NI80FE20/FE50MN50 BILAYERS

被引:315
作者
JUNGBLUT, R
COEHOORN, R
JOHNSON, MT
DESTEGGE, JA
REINDERS, A
机构
[1] Philips Research Laboratories, 5656 AA Eindhoven
关键词
D O I
10.1063/1.356888
中图分类号
O59 [应用物理学];
学科分类号
摘要
The exchange biasing field (Hb) and coercive field (H(c)) of molecular-beam-epitaxy-grown Cu/Ni80Fe20/Fe50Mn50 Samples in [111], [001], and [110] orientations have been investigated by longitudinal Kerr effect measurements. Ni80Fe20 and Fe50Mn50 were deposited as orthogonal wedge-shaped layers on single-crystal Cu substrates in a magnetic field, enabling the study of the thickness dependence of H(eb) and H(c) on a single sample for each orientation. A strong dependence of H(eb) and H(c) on the growth orientation is observed. The results are interpreted in terms of the observed noncollinear spin structure of the antiferromagnet and a comparison is given with the predictions from recent theoretical models.
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页码:6659 / 6664
页数:6
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