DOMINANT REACTION CHANNELS AND THE MECHANISM OF SILANE DECOMPOSITION IN A H2-SI(S)-SIH4 GLOW-DISCHARGE

被引：28

作者：

ENSSLEN, K ^{[1
]}

VEPREK, S ^{[1
]}

机构：

[1] UNIV ZURICH,INST INORGAN CHEM,WINTERTHURERSTR 190,CH-8057 ZURICH,SWITZERLAND

来源：

关键词：

D O I：

10.1007/BF01019174

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

SEMICONDUCTING SILICON

引用

页码：139 / 153

页数：15

共 24 条

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