SINTERED AEROSOL MASKS FOR DRY-ETCHED QUANTUM DOTS

被引：25

作者：

DEPPERT, K ^{[1
]}

MAXIMOV, I ^{[1
]}

SAMUELSON, L ^{[1
]}

HANSSON, HC ^{[1
]}

WEIDENSOHLER, A ^{[1
]}

机构：

[1] LUND UNIV,DEPT NUCL PHYS,S-22362 LUND,SWEDEN

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 24期

关键词：

D O I：

10.1063/1.111314

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on a sintering step in producing ultra-fine silver aerosol particles to serve as etch masks for semiconductor quantum-dot structures. Our experiments found heating conditions that reshape the Ag particles, resulting in a spherical shape and very good size uniformities. Using this improved aerosol generation technology, we have dry etched InP columns with 24 +/- 5 nm diameter and with very good uniformity, with nearly every aerosol particle resulting in a column. Column arrays with a density as high as 3 X 10(9) cm-2 could be produced.

引用

页码：3293 / 3295

页数：3

共 4 条

[1] FABRICATION OF QUANTUM-DOT STRUCTURES USING AEROSOL DEPOSITION AND PLASMA-ETCHING TECHNIQUES
MAXIMOV, I
GUSTAFSSON, A
HANSSON, HC
SAMUELSON, L
SEIFERT, W
WIEDENSOHLER, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 748 - 753
[2] SAMUELSON L, 1993, MAT RES S C, V283, P789
[3] GENERATION OF MONODISPERSE AG-AEROSOL AND NACL-AEROSOL WITH PARTICLE DIAMETERS BETWEEN 2-NM AND 300-NM
SCHEIBEL, HG
PORSTENDORFER, J
[J]. JOURNAL OF AEROSOL SCIENCE, 1983, 14 (02) : 113 - &
[4] NANOMETER PATTERNING OF INP USING AEROSOL AND PLASMA-ETCHING TECHNIQUES
WIEDENSOHLER, A
HANSSON, HC
MAXIMOV, I
SAMUELSON, L
[J]. APPLIED PHYSICS LETTERS, 1992, 61 (07) : 837 - 839

← 1 →