TEMPORAL BEHAVIOR OF X-RAY-RADIATION EMITTED BY SUBPICOSECOND KRF-LASER-HEATED CARBON PREPLASMAS

被引：24

作者：

WULKER, C ^{[1
]}

THEOBALD, W ^{[1
]}

SCHAFER, FP ^{[1
]}

BAKOS, JS ^{[1
]}

机构：

[1] RES INST PARTICLE & NUCL PHYS, DEPT PLASMA PHYS, H-1525 BUDAPEST, HUNGARY

来源：

PHYSICAL REVIEW E | 1994年 / 50卷 / 06期

关键词：

D O I：

10.1103/PhysRevE.50.4920

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The soft x-ray radiation intensity ([5, 45]) emitted by a carbon plasma after the interaction of a short ultrahigh-intensity KrF laser pulse with preplasmas of different scale lengths was investigated. This was done spectrally and temporally resolved by means of a time-resolving spectrograph. A strong increase in the duration of this radiation with larger scale lengths is observed, which is qualitatively explained by a shift of the heat deposition to smaller densities. © 1994 The American Physical Society.

引用

页码：4920 / 4925

页数：6

共 21 条

[1]

Born M, 1980, PRINCIPLES OPTICS

[2] PROSPECTS FOR RESONANT PHOTOEXCITATION AS A PUMPING MECHANISM FOR X-RAY LASERS [J].

CHICHKOV, BN ;

FILL, EE .

PHYSICAL REVIEW A, 1990, 42 (01) :599-610

[3]

CHICHKOV BN, 1992, I PHYS C SER, V125, P223

[4] ABSORPTION OF SUBPICOSECOND ULTRAVIOLET-LASER PULSES IN HIGH-DENSITY PLASMA [J].

FEDOSEJEVS, R ;

OTTMANN, R ;

SIGEL, R ;

KUHNLE, G ;

SZATMARI, S ;

SCHAFER, FP .

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1990, 50 (02) :79-99

[5] SOFT-X-RAY-INDUCED SECONDARY-ELECTRON EMISSION FROM SEMICONDUCTORS AND INSULATORS - MODELS AND MEASUREMENTS [J].

HENKE, BL ;

LIESEGANG, J ;

SMITH, SD .

PHYSICAL REVIEW B, 1979, 19 (06) :3004-3021

[6] TIME-RESOLVED KILOELECTRON-VOLT SPECTROSCOPY OF ULTRASHORT PLASMAS [J].

KIEFFER, JC ;

CHAKER, M ;

COTE, CY ;

BEAUDOIN, Y ;

PEPIN, H ;

CHIEN, CY ;

COE, S ;

MOUROU, G .

APPLIED OPTICS, 1993, 32 (22) :4247-4252

[7]

KRUER WL, 1988, PHYSICS LASER PLASMA

[8] SCANNING-X-RAY MICROSCOPY USING A LASER-PLASMA SOURCE [J].

MICHETTE, AG ;

TURCU, ICE ;

SCHULZ, MS ;

BROWNE, MT ;

MORRISON, GR ;

FLUCK, P ;

BUCKLEY, CJ ;

FOSTER, GF .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (06) :1478-1482

[9] A LASER-GENERATED PLASMA SOURCE FOR X-RAY-LITHOGRAPHY AND VLSI [J].

MICHETTE, AG ;

ROGOYSKI, AM ;

BURGE, RE .

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1988, 21 (10) :959-965

[10] THEORETICAL-MODEL OF ABSORPTION OF LASER-LIGHT BY A PLASMA [J].

MORA, P .

PHYSICS OF FLUIDS, 1982, 25 (06) :1051-1056

← 1 2 3 →