DOPING DENSITY DEPENDENT ATTACHMENT OF RHB ON TIO2 ELECTRODES

被引：17

作者：

SCHUMACHER, R ^{[1
]}

WILSON, RH ^{[1
]}

HARRIS, LA ^{[1
]}

机构：

[1] GE,CORP RES & DEV,SCHENECTADY,NY 12301

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期

关键词：

D O I：

10.1149/1.2129648

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：96 / 99

页数：4

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