GROWTH OF THIN-FILM NIOBIUM AND NIOBIUM OXIDE LAYERS BY MOLECULAR-BEAM EPITAXY

被引：23

作者：

PETRUCCI, M

PITT, CW

REYNOLDS, SR

MILLEDGE, HJ

MENDELSSOHN, MJ

DINEEN, C

FREEMAN, WG

机构：

[1] UNIV LONDON UNIV COLL,DEPT GEOL SCI,CRYSTALLOG UNIT,LONDON WC1E 6BT,ENGLAND

[2] GEC HIRST RES CTR,WEMBLEY,MIDDX,ENGLAND

来源：

关键词：

D O I：

10.1063/1.341140

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：900 / 909

页数：10

共 46 条

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