THERMAL-EXPANSION BEHAVIOR OF SILICON AT LOW-TEMPERATURES

被引：55

作者：

SHAH, JS

STRAUMANIS, ME

机构：

来源：

SOLID STATE COMMUNICATIONS | 1972年 / 10卷 / 01期

关键词：

D O I：

10.1016/0038-1098(72)90371-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：159 / +

页数：1

共 9 条

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