THE CORRELATION BETWEEN SELECTIVE OXIDE ETCHING AND THERMODYNAMIC PREDICTION

被引：8

作者：

MCNEVIN, SC

机构：

[1] McNevin, S.C.

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579830

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：797 / 800

页数：4

共 9 条

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[7] FLUOROCARBON HIGH-DENSITY PLASMAS .2. SILICON DIOXIDE AND SILICON ETCHING USING CF4 AND CHF3 [J].

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