ABSOLUTE RATE-CONSTANT AND TEMPERATURE-DEPENDENCE FOR THE REACTION OF SILYLENE WITH NITROUS-OXIDE

被引：31

作者：

BECERRA, R ^{[1
]}

FREY, HM ^{[1
]}

MASON, BP ^{[1
]}

WALSH, R ^{[1
]}

机构：

[1] UNIV READING,DEPT CHEM,READING RG6 2AD,BERKS,ENGLAND

来源：

CHEMICAL PHYSICS LETTERS | 1991年 / 185卷 / 5-6期

关键词：

D O I：

10.1016/0009-2614(91)80234-O

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Absolute rate constants have been measured for the reaction of SiH2 with N2O at temperatures between 295-747 K. The rate constants are fitted to the Arrhenius equation: log (k/cm3 molecule-1 s-1) = (-12.09 +/- 0.04) + (2.02 +/- 0.31) kJ mol-1/RT ln 10. The data are plausibly consistent with a mechanism involving a short-lived H2SiON2 addition complex leading to formation of H2SiO + N2. Comparisons are made with other silylene reactions. The fate and stability of H2SiO are briefly discussed. The significance of these measurements for the kinetic modelling of the chemical vapour deposition of silicon oxide from silane/N2O mixtures is also commented on.

引用

页码：415 / 420

页数：6

共 40 条

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