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SAMPLING AND ANALYTICAL CHARACTERISTICS OF AN ELECTRICALLY VAPORIZED THIN-FILM PLASMA IN AN EXTERNAL MAGNETIC-FIELD
被引:9
作者
:
ALBERS, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
ALBERS, D
[
1
]
TISACK, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
TISACK, M
[
1
]
SACKS, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, R
[
1
]
机构
:
[1]
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
来源
:
APPLIED SPECTROSCOPY
|
1987年
/ 41卷
/ 01期
关键词
:
D O I
:
10.1366/0003702874867972
中图分类号
:
TH7 [仪器、仪表];
学科分类号
:
0804 ;
080401 ;
081102 ;
摘要
:
引用
收藏
页码:131 / 139
页数:9
相关论文
共 19 条
[1]
RADIATIVE PROPERTIES OF AN ELECTRICALLY-VAPORIZED THIN-FILM PLASMA IN AN EXTERNAL MAGNETIC-FIELD
ALBERS, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
ALBERS, D
SACKS, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, R
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1986,
41
(04)
: 391
-
402
[2]
MAGNETICALLY TAILORED, ATMOSPHERIC-PRESSURE PLASMAS FOR ATOMIC SPECTROSCOPY
ALBERS, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
ALBERS, D
JOHNSON, E
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
JOHNSON, E
TISACK, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
TISACK, M
SACKS, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, R
[J].
APPLIED SPECTROSCOPY,
1986,
40
(01)
: 60
-
70
[3]
COMPUTER-SIMULATION OF INDUCTIVELY COUPLED PLASMA DISCHARGE FOR SPECTROCHEMICAL ANALYSIS .2. COMPARISON OF TEMPERATURE AND VELOCITY PROFILES, AND PARTICLE DECOMPOSITION FOR INDUCTIVELY COUPLED PLASMA DISCHARGES IN ARGON AND NITROGEN
BARNES, RM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
BARNES, RM
NIKDEL, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
NIKDEL, S
[J].
APPLIED SPECTROSCOPY,
1976,
30
(03)
: 310
-
320
[4]
Boyd T. J., 1969, PLASMA DYNAMICS
[5]
LASER VAPORIZATION OF SOLID METAL SAMPLES INTO AN INDUCTIVELY COUPLED PLASMA
CARR, JW
论文数:
0
引用数:
0
h-index:
0
CARR, JW
HORLICK, G
论文数:
0
引用数:
0
h-index:
0
HORLICK, G
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1982,
37
(01)
: 1
-
15
[6]
CHEN F, 1974, INTRO PLASMA PHYSICS
[7]
DIRECT DETERMINATION OF SELECTED METALS IN REFRACTORY POWDER MICRO SAMPLES WITH EXPLODING THIN-FILM EXCITATION
CLARK, EM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
CLARK, EM
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1980,
35
(08)
: 471
-
488
[8]
COLLINS R, 1983, ANAL CHEM, V55, P2179
[9]
EMISSION SPECTROSCOPY OF TRACE IMPURITIES IN POWDERED SAMPLES WITH A HIGH-FREQUENCY ARGON PLASMA TORCH
DAGNALL, RM
论文数:
0
引用数:
0
h-index:
0
DAGNALL, RM
SMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SMITH, DJ
WEST, TS
论文数:
0
引用数:
0
h-index:
0
WEST, TS
GREENFIE.S
论文数:
0
引用数:
0
h-index:
0
GREENFIE.S
[J].
ANALYTICA CHIMICA ACTA,
1971,
54
(03)
: 397
-
&
[10]
PREPARATION AND CHARACTERIZATION OF THIN METAL-FILMS FOR EXPLODING-CONDUCTOR EXCITATION
DUCHANE, DV
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
DUCHANE, DV
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
ANALYTICAL CHEMISTRY,
1978,
50
(13)
: 1752
-
1757
←
1
2
→
共 19 条
[1]
RADIATIVE PROPERTIES OF AN ELECTRICALLY-VAPORIZED THIN-FILM PLASMA IN AN EXTERNAL MAGNETIC-FIELD
ALBERS, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
ALBERS, D
SACKS, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, R
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1986,
41
(04)
: 391
-
402
[2]
MAGNETICALLY TAILORED, ATMOSPHERIC-PRESSURE PLASMAS FOR ATOMIC SPECTROSCOPY
ALBERS, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
ALBERS, D
JOHNSON, E
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
JOHNSON, E
TISACK, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
TISACK, M
SACKS, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, R
[J].
APPLIED SPECTROSCOPY,
1986,
40
(01)
: 60
-
70
[3]
COMPUTER-SIMULATION OF INDUCTIVELY COUPLED PLASMA DISCHARGE FOR SPECTROCHEMICAL ANALYSIS .2. COMPARISON OF TEMPERATURE AND VELOCITY PROFILES, AND PARTICLE DECOMPOSITION FOR INDUCTIVELY COUPLED PLASMA DISCHARGES IN ARGON AND NITROGEN
BARNES, RM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
BARNES, RM
NIKDEL, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
UNIV MASSACHUSETTS,DEPT CHEM,AMHERST,MA 01002
NIKDEL, S
[J].
APPLIED SPECTROSCOPY,
1976,
30
(03)
: 310
-
320
[4]
Boyd T. J., 1969, PLASMA DYNAMICS
[5]
LASER VAPORIZATION OF SOLID METAL SAMPLES INTO AN INDUCTIVELY COUPLED PLASMA
CARR, JW
论文数:
0
引用数:
0
h-index:
0
CARR, JW
HORLICK, G
论文数:
0
引用数:
0
h-index:
0
HORLICK, G
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1982,
37
(01)
: 1
-
15
[6]
CHEN F, 1974, INTRO PLASMA PHYSICS
[7]
DIRECT DETERMINATION OF SELECTED METALS IN REFRACTORY POWDER MICRO SAMPLES WITH EXPLODING THIN-FILM EXCITATION
CLARK, EM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
CLARK, EM
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1980,
35
(08)
: 471
-
488
[8]
COLLINS R, 1983, ANAL CHEM, V55, P2179
[9]
EMISSION SPECTROSCOPY OF TRACE IMPURITIES IN POWDERED SAMPLES WITH A HIGH-FREQUENCY ARGON PLASMA TORCH
DAGNALL, RM
论文数:
0
引用数:
0
h-index:
0
DAGNALL, RM
SMITH, DJ
论文数:
0
引用数:
0
h-index:
0
SMITH, DJ
WEST, TS
论文数:
0
引用数:
0
h-index:
0
WEST, TS
GREENFIE.S
论文数:
0
引用数:
0
h-index:
0
GREENFIE.S
[J].
ANALYTICA CHIMICA ACTA,
1971,
54
(03)
: 397
-
&
[10]
PREPARATION AND CHARACTERIZATION OF THIN METAL-FILMS FOR EXPLODING-CONDUCTOR EXCITATION
DUCHANE, DV
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
DUCHANE, DV
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
ANALYTICAL CHEMISTRY,
1978,
50
(13)
: 1752
-
1757
←
1
2
→