PROPERTIES OF SN-DOPED INDIUM OXIDE PREPARED BY HIGH-RATE AND LOW-TEMPERATURE RF SPUTTERING

被引：23

作者：

ITOYAMA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 07期

关键词：

D O I：

10.1143/JJAP.17.1191

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1191 / 1196

页数：6

共 11 条

[1] STRUCTURE OF INDIUM OXIDE TIN OXIDE TRANSPARENT CONDUCTING FILMS BY ELECTRON-DIFFRACTION AND ELECTRON SPECTROSCOPY [J].

BOSNELL, JR ;

WAGHORNE, R .

THIN SOLID FILMS, 1973, 15 (02) :141-148

[2] PROPERTIES OF SN-DOPED IN2O3 FILMS PREPARED BY RF SPUTTERING [J].

FAN, JCC ;

BACHNER, FJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1719-1725

[3] HIGHLY CONDUCTIVE, TRANSPARENT FILMS OF SPUTTERED IN2-XSNXO3-Y [J].

FRASER, DB ;

COOK, HD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (10) :1368-&

[4]

GROTH R, 1965, PHILIPS TECH REV, V26, P105

[5] STUDY OF FILMS HAVING BASE OF TIN OXIDE AND INDIUM OXIDE BY MEANS OF X-RAY-DIFFRACTION [J].

HECQ, M ;

DUBOIS, A ;

VANCAKEN.J .

THIN SOLID FILMS, 1973, 18 (01) :117-125

[6]

HORI Y, 1965, OYO BUTSURI, V34, P507

[7]

METHA RR, 1972, J ELECTROCHEM SOC, V119, P752

[8] CHARACTERIZATION OF TRANSPARENT CONDUCTIVE THIN-FILMS OF INDIUM OXIDE [J].

MOLZEN, WW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :99-102

[9]

SOBAJIMA S, 1974, JPN J APPL PHYS, P475

[10] TRANSPARENT CONDUCTIVE SN-DOPED INDIUM OXIDE COATINGS DEPOSITED BY REACTIVE SPUTTERING WITH A POST CATHODE [J].

THORNTON, JA ;

HEDGCOTH, VL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :117-121

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