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PROPERTIES OF ULTRATHIN AG-FILMS AND AU-FILMS ON SI(111)7X7
被引:9
作者
:
MARKERT, K
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
MARKERT, K
[
1
]
PERVAN, P
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
PERVAN, P
[
1
]
HEICHLER, W
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
HEICHLER, W
[
1
]
WANDELT, K
论文数:
0
引用数:
0
h-index:
0
机构:
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
WANDELT, K
[
1
]
机构
:
[1]
MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER
来源
:
SURFACE SCIENCE
|
1989年
/ 211卷
/ 1-3期
关键词
:
D O I
:
10.1016/0039-6028(89)90820-0
中图分类号
:
O64 [物理化学(理论化学)、化学物理学];
学科分类号
:
070304 ;
081704 ;
摘要
:
引用
收藏
页码:611 / 619
页数:9
相关论文
共 17 条
[1]
THE UNDERLAYER INFLUENCE ON PHOTOEMISSION AND THERMAL-DESORPTION OF XENON ADSORBED ON AG(111)
BEHM, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
BEHM, RJ
BRUNDLE, CR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
BRUNDLE, CR
WANDELT, K
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
WANDELT, K
[J].
JOURNAL OF CHEMICAL PHYSICS,
1986,
85
(02)
: 1061
-
1073
[2]
ELECTRONIC PROPERTIES OF SILICON-TRANSITION METAL INTERFACE COMPOUNDS
Calandra, C.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Calandra, C.
Bisi, O.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Bisi, O.
Ottaviani, G.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Ottaviani, G.
[J].
SURFACE SCIENCE REPORTS,
1985,
4
(5-6)
: 271
-
364
[3]
XE AND KR ADSORPTION ON THE SI(111) 7X7 SURFACE
CONRAD, E
论文数:
0
引用数:
0
h-index:
0
CONRAD, E
WEBB, MB
论文数:
0
引用数:
0
h-index:
0
WEBB, MB
[J].
SURFACE SCIENCE,
1983,
129
(01)
: 37
-
58
[4]
RARE-GAS TITRATION STUDIES OF SI(111) SURFACES
DEMUTH, JE
论文数:
0
引用数:
0
h-index:
0
DEMUTH, JE
SCHELLSOROKIN, AJ
论文数:
0
引用数:
0
h-index:
0
SCHELLSOROKIN, AJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1984,
2
(02):
: 808
-
811
[5]
SURFACES OF SILICON
HANEMAN, D
论文数:
0
引用数:
0
h-index:
0
HANEMAN, D
[J].
REPORTS ON PROGRESS IN PHYSICS,
1987,
50
(08)
: 1045
-
1086
[6]
ANGLE RESOLVED PHOTOEMISSION MEASUREMENTS ON AG-SI(111) 7X7 INTERFACES
HOUZAY, F
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
HOUZAY, F
GUICHAR, GM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
GUICHAR, GM
CROS, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
CROS, A
SALVAN, F
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
SALVAN, F
PINCHAUX, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
PINCHAUX, R
DERRIEN, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
DERRIEN, J
[J].
SURFACE SCIENCE,
1983,
124
(01)
: L1
-
L8
[7]
HUANG JH, UNPUB PHYS REV LETT
[8]
SURFACE AND BULK CORE-LEVEL SHIFTS OF THE SI(111) SQUARE-ROOT-3 X SQUARE-ROOT-3-AG SURFACE - EVIDENCE FOR A CHARGED SQUARE-ROOT-3 X SQUARE-ROOT-3 LAYER
KONO, S
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KONO, S
HIGASHIYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
HIGASHIYAMA, K
KINOSHITA, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KINOSHITA, T
MIYAHARA, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
MIYAHARA, T
KATO, H
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KATO, H
OHSAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
OHSAWA, H
ENTA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
ENTA, Y
MAEDA, F
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
MAEDA, F
YAEGASHI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
YAEGASHI, Y
[J].
PHYSICAL REVIEW LETTERS,
1987,
58
(15)
: 1555
-
1558
[9]
PHYSICS AND ELECTRONICS OF THE NOBLE-METAL ELEMENTAL-SEMICONDUCTOR INTERFACE FORMATION - A STATUS-REPORT
LELAY, G
论文数:
0
引用数:
0
h-index:
0
LELAY, G
[J].
SURFACE SCIENCE,
1983,
132
(1-3)
: 169
-
204
[10]
MARKERT K, UNPUB
←
1
2
→
共 17 条
[1]
THE UNDERLAYER INFLUENCE ON PHOTOEMISSION AND THERMAL-DESORPTION OF XENON ADSORBED ON AG(111)
BEHM, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
BEHM, RJ
BRUNDLE, CR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
BRUNDLE, CR
WANDELT, K
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
IBM CORP, RES LAB, SAN JOSE, CA 95193 USA
WANDELT, K
[J].
JOURNAL OF CHEMICAL PHYSICS,
1986,
85
(02)
: 1061
-
1073
[2]
ELECTRONIC PROPERTIES OF SILICON-TRANSITION METAL INTERFACE COMPOUNDS
Calandra, C.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Calandra, C.
Bisi, O.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Bisi, O.
Ottaviani, G.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Modena, Dept Fis, Via Campi 213-A, I-41100 Modena, Italy
Ottaviani, G.
[J].
SURFACE SCIENCE REPORTS,
1985,
4
(5-6)
: 271
-
364
[3]
XE AND KR ADSORPTION ON THE SI(111) 7X7 SURFACE
CONRAD, E
论文数:
0
引用数:
0
h-index:
0
CONRAD, E
WEBB, MB
论文数:
0
引用数:
0
h-index:
0
WEBB, MB
[J].
SURFACE SCIENCE,
1983,
129
(01)
: 37
-
58
[4]
RARE-GAS TITRATION STUDIES OF SI(111) SURFACES
DEMUTH, JE
论文数:
0
引用数:
0
h-index:
0
DEMUTH, JE
SCHELLSOROKIN, AJ
论文数:
0
引用数:
0
h-index:
0
SCHELLSOROKIN, AJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1984,
2
(02):
: 808
-
811
[5]
SURFACES OF SILICON
HANEMAN, D
论文数:
0
引用数:
0
h-index:
0
HANEMAN, D
[J].
REPORTS ON PROGRESS IN PHYSICS,
1987,
50
(08)
: 1045
-
1086
[6]
ANGLE RESOLVED PHOTOEMISSION MEASUREMENTS ON AG-SI(111) 7X7 INTERFACES
HOUZAY, F
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
HOUZAY, F
GUICHAR, GM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
GUICHAR, GM
CROS, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
CROS, A
SALVAN, F
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
SALVAN, F
PINCHAUX, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
PINCHAUX, R
DERRIEN, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
UNIV PARIS 11,LURE,F-91405 ORSAY,FRANCE
DERRIEN, J
[J].
SURFACE SCIENCE,
1983,
124
(01)
: L1
-
L8
[7]
HUANG JH, UNPUB PHYS REV LETT
[8]
SURFACE AND BULK CORE-LEVEL SHIFTS OF THE SI(111) SQUARE-ROOT-3 X SQUARE-ROOT-3-AG SURFACE - EVIDENCE FOR A CHARGED SQUARE-ROOT-3 X SQUARE-ROOT-3 LAYER
KONO, S
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KONO, S
HIGASHIYAMA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
HIGASHIYAMA, K
KINOSHITA, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KINOSHITA, T
MIYAHARA, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
MIYAHARA, T
KATO, H
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
KATO, H
OHSAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
OHSAWA, H
ENTA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
ENTA, Y
MAEDA, F
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
MAEDA, F
YAEGASHI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
YAEGASHI, Y
[J].
PHYSICAL REVIEW LETTERS,
1987,
58
(15)
: 1555
-
1558
[9]
PHYSICS AND ELECTRONICS OF THE NOBLE-METAL ELEMENTAL-SEMICONDUCTOR INTERFACE FORMATION - A STATUS-REPORT
LELAY, G
论文数:
0
引用数:
0
h-index:
0
LELAY, G
[J].
SURFACE SCIENCE,
1983,
132
(1-3)
: 169
-
204
[10]
MARKERT K, UNPUB
←
1
2
→